Pulsed-DC Systems
Enhance Deposition Rates
and Improve Film Flatness
Extend process innovation with Advanced Energy’s comprehensive pulsed-DC suite.
Minimize arcing, enhance deposition rate, improve film flatness and packing density.
Ascent AP Series
Unprecedented Power Control for Single- and Dual-Magnetron Sputtering
Ascent® AP power supplies deliver unprecedented plasma control in a compact solution for single-magnetron and dual-magnetron sputtering.
Advanced Energy’s patented pulsing technology enables remarkable arc prevention, higher power levels, and increased throughput.
Ascent AP’s comprehensive control parameters and wide operational range unlock material options to extend process flexibility and material innovation.
DESCRIPTION
Achieve new levels of process performance using field-proven, bipolar DC pulsing technology.
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Advanced waveform control allows process fine-tuning
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Available for both dual-pulsed and single-pulsed magnetron sputtering applications
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Compact design incorporates DC and pulsing
BENEFITS
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Precise sputtering of dielectric and conductive films
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Extended process control and flexibility
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High film quality and throughput
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Repeatable, customizable films
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Higher power levels with reduced arc damage
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Easy integration and control
FEATURES
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Process customization with extensive power delivery parameters
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Advanced process management through a tiered approach to arc mitigation
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Compact, single-unit solution (up to 30 kW)
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Set Point Compensation™ technology for stable throughput
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Wide operational range to enable a variety of process materials
APPLICATIONS
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Flat Panel Display
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Glass Coating
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Industrial Coatings
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Solar Photovoltaics
Pinnacle Plus+
Process-Proven, Pulsed DC for Single-Magnetron Reactive Sputtering of Thin Dielectric Films
Advanced Energy Pinnacle® Plus+ power supplies provide all the advantages of a pulsed-DC solution for reactive processes — in an easily integrated package that increases process efficiency, reduces costs, and offers superior flexibility and latitude.
Combining standard DC technology and our patented pulsed-DC technology, the Pinnacle Plus+ power supplies provide higher deposition rates, more repeatable performance, and exceptional film quality compared to complicated and expensive AC-power solutions.
DESCRIPTION
Pinnacle Plus+ generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric films.
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Charge clearing during the reverse pulse prevents arcs from developing
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Adjustable process through frequency and duty cycle control
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Compact air-cooled design expandable in primary/secondary configurations
BENEFITS
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Higher deposition and yield rates
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Superior film uniformity and quality
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Reduced substrate damage caused by arcing
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Excellent process flexibility and latitude
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Repeatable performance
APPLICATIONS
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Deposition
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Flat Panel Displays
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Glass Coatings
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Industrial Coatings
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Semiconductor Manufacturing
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Solar Photovoltaics
Arc-Bias Solvix
An Arc-Bias Solution that Brings a New Level of Precision and Productivity to Cathodic Arc Processes
Powerful arc discharges, rapid vaporization of target material, and high-energy ions make cathodic arc deposition both powerful and potentially unstable.
Available at a range of current levels up to 400 A, Solvix® arc supplies deliver excellent plasma ionization, ion energy, and throughput — with remarkable power and process control. Solvix supplies add an even greater degree of control over film properties, for remarkably hard, dense, durable, adherent films.
DESCRIPTION
Solvix power supplies are specifically designed to enable advanced, high-tech coatings.
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New coating capabilities with precision bias generators
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Industry-leading reliability while powering extremely dynamic ARC processes
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System optimization with a wide variety of models available
BENEFITS
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Reduced substrate damage and better yield
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Excellent film density and adhesion
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Proven reliability and high throughput
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Adaptability to a wide range of process requirements
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Efficient installation and support
APPLICATIONS
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Industrial Coatings